Varian Semiconductor Equipment Associates -- VSEA Message Board

STOCKTALK

We've detected that you're using an ad content blocking browser plug-in or feature. Ads provide a critical source of revenue to the continued operation of Silicon Investor. We ask that you disable ad blocking while on Silicon Investor in the best interests of our community. If you are not using an ad blocker but are still receiving this message, make sure your browser's tracking protection is set to the 'standard' level.

Technology Stocks : Varian Semiconductor Equipment Associates -- VSEA

Public Reply Prvt Reply Mark as Last Read File

Previous 10 Next 10 Previous Next

From: etchmeister	7/25/2009 10:34:45 PM
	of 1929

I feel good - from last CC Number of implants continues to increase: One interesting one was one of our largest flash customers with a pretty significant increase in terms of number of implants steps. I think it was something like 10 additional medium current steps and three additional high currently steps. "Non Typical" implant applications are emerging in conjunction with etch and litho: There is one customer, that large logic customer (Intel?) that's adding a new litho implant that will add implant capacity as they go to the next technology nodes. Those things are also potential opportunities for us. One of our largest memory customers also has implemented implant to improve edge uniformity and achieve pattern-independent etched-up and shape control as part of the production process flow for their next technology node. Pent up demand for 5x transition: So as you know, there is a number of DRAM customers in Asia, Taiwan and elsewhere that if they want to ramp their 5X tools like PLAD, they need to buy to ramp, because they qualify it as a tool they're going to use, but they don't buy any real volume. CMOS sensors: We also have an opportunity to drive further penetration of our VIISta beam line products into the CMOS image sensor market. One of our largest customers in FY '09 is a Japanese CMOS image sensor account where we have significant penetration in high current and high energy. Conversion from trench to stack: I don't know that we have that exact number, but one of the things that is happening, those customers that were running trench in DRAM will be implementing dual Poly-gate with PLAD tools...right now is, it's a very small number just of initial tools as they ramp the first phase of the capacity. Of course, as those fabs ramp, that's a big opportunity for us. That’s conversion from trench to stack. source: seeking alfa CC April 2009 transcript

Report TOU Violation

Share This Post

Public Reply Prvt Reply Mark as Last Read File

Previous 10 Next 10 Previous Next