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Moderated By: Ritz -- (Not Moderated) -- Started: 5/15/1997 10:02:00 PM  Revision History

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1812Japan’s Ushio will discontinue its R&D for EUV light sources and will sell FUBHO-05/13/2013 07:55 PM
1811 TSMC reiterates plans for 18-inch wafer manufacturing Josephine Lien, Taipei; JFUBHO-05/10/2013 12:24 AM
1810The secrets of 14nm lithography 03/28/2013 By Gandharv Bhatara, Mentor GraphicsFUBHO103/31/2013 01:32 PM
1809At SPIE, ASMLHolding disclosed various milestones with its extreme ultraviolet FUBHO-03/05/2013 12:16 AM
1808At SPIE, ASMLHolding disclosed various milestones with its extreme ultraviolet FUBHO-03/05/2013 12:16 AM
1807 IEDM: Moore’s Law seen hitting big bump at 14 nm Rick Merritt12/11/2012 12:01 FUBHO-02/19/2013 04:50 PM
1806ISSCC: ASML says EUV best option at 10nm Rick Merritt2/19/2013 3:21 AM EST SAN FUBHO102/19/2013 12:12 PM
1805ASML and Cymer to tackle EUV together Brian Bailey10/17/2012 9:49 AM EDT http:FUBHO110/17/2012 02:20 PM
1804ASML to acquire Cymer to accelerate development of EUV technology [graphic]PresFUBHO210/17/2012 02:01 AM
1803Moore's Law threatened by lithography woes Rick Merritt10/5/2012 9:26 AM EDTFUBHO110/05/2012 09:07 PM
1802 ASML outlines a FinFET process 'two-step' Peter Clarke eetimes.com FUBHO107/20/2012 09:32 AM
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