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General Lithography
An SI Board Since December 1996
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Emcee:  Andrew Vance Type:  Unmoderated
The purpose of this thread is to discuss all aspects of General Photolithography as it pertains to the financials and technicals of those companies that deal into the Semiconductor, Thin Film Head(TFH), Magnetoresistive Head (MRH), micromachining and Flat panel display technologies. It is hoped that sound technical and financial dialogue can occur and that participants inform us where we can better post some of the information presented here.

To start off, I beleive Wally the Sandcrab has mentioned a new application of equipment for the manufacturing of MRHs for the disk drive companies. More will follow.

I beleive that ISI will be an up and comer in the next year for Deep UV lithography and has recently entered into a cooperative effort with Lucent Technology (old Bell Labs/AT&T) for commercializing the next generation of e-beam technology. Rumor also has it that x-ray programs are being contemplated for the not to distanct future. Watch for ISI to go public in 1997. Could be an unknown and undiscovered new company with a very long history in lithography.

SVGL may be late in delivering the Micrascan to Sematech and may use Intel as their "real" beta sight. However, Intel, with all its $$$ and expertise will probably be looking at all available Deep UV steppers on the market for their next generation microP. I do not beleive this will be all encompassing since the resist chemistry is still not real stable so Deep UV will be used only on the most critical levels. IMHO (I finally learned this means "In my humble opinion") I beleive that Intel will evaluate all the equipment out there and will buy what works the best. They have too much at stake not to use the very best since $$$ is really no object. IF SVGL is the chosen company, Intel could consume a vast majority of its manufacturing capacity thus causing other potential customers to go elsewhere for Deep UV tools.

FSII Polaris cluster tool is a decent system with a high price tag relative to other systems but is worthy of mention here for 3 reasons.

1. Price is sub 14 and is starting to look attractive.
2. New cryogenic cleaning system is about to gain market acceptance and will be a desirable component for advanced processing requiring extreme low defect densities.
3. FSII is the premier cleaning company out in the marketplace.

UTEK is my favorite company and I need to make this bias known up front. I will try to be objective at all times when discussing them but I want everyone to be aware of a potential bias. I know the people, I know the equipment, I use the equipment, and I am 100% satisfied with the product offering and its COO (Cost Of Ownership).

WFR is the most mistunderstood company on the NYSE representing the High Tech Sector. At worst I see a 5% price erosion in 1997, delays in going full force in 1 or 2 expansion operations, and some softness in epi wafer sales which are their high ticket items. When the DRAMs and other IC manufacturers ramp up again in mid 1997 (conservative), these guys will go gangbusters since they will be positioned well to respond. They still need to qualify some of their new facilities.

By the way, as much as I hate to say it, we all must recognize Ed Sachs' (ZILOG CEO) comments aerlier this year. He basically called the wafer shortage problem of early 1996 as a bunch of crap. He was right and we were all wrong. There was enough silicon to go around for most of the year (how did he know the DRAM market was going to bottom out).

Here is a start. I hope this thread becomes useful for all.
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1305 For 2015, ASML was the market leader in this sector on a revenue basis a 78.6% FUBHO-7/7/2017
1304I hope again we hear from you Vance, I following you for years in the 90's.yekaah-10/22/2005
1303Curious.....are you the same Andrew Vance as in the article? llnl.govProud_Infidel-1/11/2005
1302interesting article on an e-beam start-up. siliconstrategies.comMichael Dunn-8/27/2002
1301I read the article with great interest and it makes a great deal of sense. The sAndrew Vance-8/16/2002
1300Very interesting articles. Thanks for posting them here. I have been away from SAndrew Vance-8/16/2002
1299X-ray Lithography: Back for Round 2 U.S. Senator Patrick Leahy anBilberry-8/12/2002
1298JMAR Announces Collaboration With MIT Professor Henry I. Smith, Leading Pioneer Bilberry-8/12/2002
1297Andrew & all, since I see so many here posting about EUV, xRAY, eBeam etc. -Crossy-7/18/2002
1296Japan venture seeks common 90-nm process By Yoshiko Hara EE Times (07/01/02 17Proud_Infidel-7/1/2002
1295The Interview: Can JMAR make X-ray fly? Semiconductor Business News (06/27/02 20Bilberry-6/30/2002
1294JMAR To Unveil Breakthrough Collimated Laser Plasma, Point-Source Lithography SyBilberry-6/20/2002
1293Matsushita, Sharp join lithography consortium By Yoshiko Hara EE Times January 7Jim Oravetz-1/18/2002
1292Low-energy e-beam proposed for next-generation lithography By Yoshiko Hara, EE TJim Oravetz-12/17/2001
1291As I understand it, the UTEK 157 nm platform is a small field development systemKatherine Derbyshire-12/17/2001
1290No one really want to hear this, but 157nm can be done with the GCA (XLS) platfoAndrew Vance-12/15/2001
1289Optical lithography could push out EUV and EPL until 2010, says ITRS roadmap silSemiBull-11/29/2001
1288Cary, This story seems to shed some light on the ASML decision to scrap the SVGIan@SI-11/29/2001
1287Andrew, Please comment on the 157nm platform. In the past, I read some opinionCary Salsberg-11/28/2001
1286Just wanted to post the following article as an historical archive and as some sAndrew Vance-11/28/2001
1285Another EUV article: news.ucf.eduBilberry-11/7/2001
1284<b>Another breakthrough in EUV:</b>
1283Chip lithography harnessed to grow living brain cells siliconstrategies.comSemiBull-8/21/2001
1282"You are correct but the other lousy stock pickers can at least say ...'SemiBull-8/15/2001
1281You are correct but the other lousy stock pickers can at least say ...''Grashopper-8/15/2001
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