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To: etchmeister who wrote (3811)12/29/2011 12:51:51 PM
From: etchmeister of 3813
 






At 22nm, the focus is first order effects....


The picture that emerges from this assessment is one of rising complexity, more physical phenomena at play and costlier equipment and wafer processing. These challenges will only become more severe at 14nm and beyond, providing a strong motivation for the development of increasingly sophisticated process and device simulation tools to offset them.

electroiq.com 
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